Equipment
In the "Multifunctional Interfaces" department, equipment is available for particle synthesis, the structuring and coating of substrates, and the analysis of thin films.
Characterization
- BET and Chemisorption (Micromeritics ASAP2020) An ASAP2020 MP HD from Micromeritics is available for high-precision physisprotion measurements to characterize surfaces, pore systems and gas-solid interactions. The ASAP2020 is equipped with the chemisprotion extension.
- Helium Pyknometry (Micromeritics AccuPyc 1340) For measuring the pure density of solids and slurries up to 10ml. Fully automated measurement process. The instrument has a multi-volume option and the FoamPyk software.
- UV-VIS-NIR Spectrophotometer Agilent Cary 5000 (HEMF) For the measurement of UV/VIS/NIR spectra our department operates an Agilent Cary 5000 spectrophotometer (175-3300 nm) with a wide range of accessories for the measurement of powders and coatings. The instrument is additionally equipped with integrating sphere (150mm), VASRA, Praying Mantis and UMA accessories.
- Differential 4-point resistance meter For the measurement of resistances, our department has a high-precision differential four-point resistance meter.
- Elektrochemical Workstations (HEMF) Our department operates several electrochemical workstations and (bi-) potentiostats from different manufacturers with solar simulators and spectrally resolved light sources to measure the ICPE.
- Ellipsometry (HEMF) We operate a Woollam RC2 X/XNIR with mapping stage and camera.
- 3D Laser-Microscopy (HEMF) For the measurement of surfaces we are equipped with a confocal 3D laser microscope from Keyence (VK-250). By using a laser, the surface is scanned without contact with an accuracy of up to a few nanometers.
- Atomic Force Microscopy (AFM) To study physical and photoelectrochemical properties at the nanoscale, our department is equipped with a Bruker Icon AFM with bipotentiostats, electrochemical cells and different LED light sources to illuminate the sample.
- Scanning Electron Microscopy (HEMF) A Zeiss EVO 15 is available for checking the laser structuring and for other investigations. The SEM is equipped with a VPSE detector and EDX.
- Surface Photo Voltage - SPV (home-built, HEMF) For photoexcitation, the instrument is equipped with a xenon lamp and a laser (Expla, NT230). Measurements are possible by means of a Kelvin Probe or in a Fixed Capacitor Setup.
Coating / Structuring / Synthesis
- Atomic Layer Deposition - ALD (HEMF) Our ALD instrument (Picosun R-200 Adv.) is equipped with several reservoirs for the use of precursors with different vapor pressures. Furthermore, it is possible to control the layer growth and the optical properties of the ALD layer in situ by means of ellipsometry (Woollam iSE). Due to the possible residual gas analysis, the instrument is optimally equipped for the development of new recipes.
The ALD also offers the possibility to coat powders. - Magneton-Süuttering We have two specialized sputtering facilities that allow the production of high-precision multilayer coating systems. Main applications are optics for X-ray applications (such as the XFEL primary mirrors) or optical meta-materials.
- RTA/RTP (HEMF) For ultra-fast heat treatment or thermal coating processes, our laboratory has a dedicated furnace from ECM/Jipelec (JetFirst 200C). With this furnace temperatures of up to 1200°C can be reached within a few seconds; operation is possible under vacuum or with different gases.
- Microwave Synthesis (HEMF) For particle synthesis we own different instruments: For recipe optimization we own a Masterwave 450 with sample changer from Anton Paar. Scale-up can be realized with a Monowave BTR (Anton Paar) up to the kilogram scale.
- Three-roll mill (HEMF) A three-roll mill from Exakt (type 80 E) is available for comminution, e.g. of crystalline structures or for de-agglomeration of particles down to the nanoscale.
- Reactive Ion Etching - RIE (HEMF) Etching processes for silicon or glass can be performed with an Oxford PlasmaPro 80 ICP. The instrument offers a temperature range of -110°C to 400°C when cooled with liquid nitrogen, with the additional option of operating in a restricted area with an inductively coupled plasma. Various gases are available for operation.
- Aerosol Deposition of Nanopraticles - AD (HEMF) At the Helmut Schmidt University in Hamburg, an experimental home-built aerosol-based coating system is available. Here, powders are dispersed to form a dry aerosol and then redeposited on the desired substrates in a vacuum. This process allows the use of nanoparticles, works without solvents and produces layers with a thickness of only a few 100 nm even on sensitive substrates.